Compositions – Radioactive compositions
Patent
1983-06-07
1986-05-06
Lechert, Jr., Stephen J.
Compositions
Radioactive compositions
134 3, 134 27, 134 28, 252146, 252631, 376310, 422159, 422903, G21F 900, C23G 102
Patent
active
045870438
ABSTRACT:
A method for decontaminating metal surfaces having radioactive oxide deposits thereon is disclosed which comprises preparing a decontamination solution having a pH of about 1.5 to about 4 comprising water, about 0.02 to about 0.5% of a water soluble organic acid which has an equilibrium constant in a complex with ferric ion of at least about 10.sup.9 and which is capable of producing a pH of about 2 to about 3 in water, and about 0.01 to about 0.4% of a chelate in free acid form which has an equilibrium constant in a complex with ferric ion of about 10.sup.15 to about 10.sup.19 and which is at least 0.4% soluble at 40.degree. C. in water having a pH of about 2 to about 3. An apparatus for performing the above method is disclosed.
REFERENCES:
patent: 3080262 (1963-03-01), Newman
patent: 3258429 (1966-06-01), Weed
patent: 3496017 (1970-02-01), Weed
patent: 3522093 (1970-07-01), Woolman
patent: 3613909 (1961-12-01), Pancer et al.
patent: 3615817 (1971-10-01), Jordan
patent: 3664870 (1972-05-01), Oberhofer et al.
patent: 3873362 (1975-03-01), Mihram et al.
patent: 4287002 (1981-09-01), Torok
Hawley, G. 1981, The Condensed Chemical Dictionary-10th edition, Van Nostrand Reinhold Company, New York, p. 852.
Becker, Jr. Lawrence F.
Murray Alexander P.
Weisberg Sharon L.
Fuerle R. D.
Lechert Jr. Stephen J.
Locker Howard J.
Westinghouse Electric Corp.
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