Decontamination apparatus for semiconductor wafer handling equip

Details Decontamination apparatus for semiconductor wafer handling equip Decontamination apparatus for semiconductor wafer handling equip

1981-12-30

1984-03-20

Bleutge, Robert L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 57R, 134108, 15306B, B08B 302

Patent

active

044374798

ABSTRACT:
Apparatus for decontaminating certain types of semiconductor wafer handling equipment is disclosed. The apparatus includes a frame having structure for applying decontaminating and electrostatic elimination fluid to handling equipment. It includes a first chamber and a second chamber. The first chamber removes contaminants from handling equipment and restricts the removed contaminants to the first chamber. The second chamber includes structure for drying handling equipment. The apparatus further includes structure for removing static from dried handling equipment.

REFERENCES:
patent: 2980938 (1961-04-01), Whelan
patent: 3421211 (1969-01-01), Eayes et al.
patent: 3884179 (1975-05-01), Szczepanski

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