Debris mitigation system and lithographic apparatus

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S50400H, C335S219000

Reexamination Certificate

active

08071963

ABSTRACT:
A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.

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Japanese Office Action for Japanese Patent Application No. 2007-328130, mailed on Feb. 1, 2011.

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