Debris mitigation system and lithographic apparatus

Details Debris mitigation system and lithographic apparatus Debris mitigation system and lithographic apparatus

2006-12-27

2010-06-15

Vanore, David A. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S503100, C378S034000

Reexamination Certificate

active

07737418

ABSTRACT:
A debris mitigation system for trapping debris coming from a tin debris-generating radiation source is provided. The debris mitigating system includes a debris barrier comprising a plurality of foils, and a cleaning system constructed and arranged to clean the foils. The cleaning system includes a supply unit to provide a liquid alloy to the foils to dissolve and flush trapped debris from the foils. The alloy includes gallium, indium, tin, or any combination thereof.

REFERENCES:
patent: 3210182 (1965-10-01), Funari
patent: 7109503 (2006-09-01), Bowering et al.
patent: 1 491 963 (2004-12-01), None
patent: 1 491 963 (2005-08-01), None

Affiliated with

Also associated with

Rating

Debris mitigation system and lithographic apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Debris mitigation system and lithographic apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Debris mitigation system and lithographic apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4206204