DC reactively sputtered antireflection coatings

Optical: systems and elements – Light interference – Produced by coating or lamina

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Details

359581, 359589, G02B 110

Patent

active

051053101

ABSTRACT:
A multilayer antireflection coating designed for deposition in in-line coating machines by DC reactive sputtering. About half of the total thickness of the coating may be formed from zinc oxide which has a high sputtering rate.

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patent: 4714308 (1987-12-01), Sawamura et al.
patent: 4997241 (1991-03-01), Muratomi
patent: 5007710 (1991-04-01), Nakajima et al.

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