DC and RF hybrid processing system

Details DC and RF hybrid processing system DC and RF hybrid processing system

2011-08-09

2011-08-09

Stark, Jarrett J (Department: 2823)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Electrical characteristic sensed

C438S005000, C438S016000, C438S017000, C438S018000, C257SE21528

Reexamination Certificate

active

07993937

ABSTRACT:
The invention can provide apparatus and methods for processing substrates and/or wafers in real-time using at least one Direct Current (DC)/Radio Frequency (RF) Hybrid (DC/RFH) processing system and associated Direct Current/Radio Frequency Hybrid (DC/RFH) procedures and DC/RFH process parameters and/or DC/RFH models.

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