Data structures and algorithms for precise defect location...

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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C348S126000, C250S559450

Reexamination Certificate

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07551769

ABSTRACT:
Described are methods and systems for providing improved defect detection and analysis using infrared thermography. Test vectors heat features of a device under test to produce thermal characteristics useful in identifying defects. The test vectors are timed to enhance the thermal contrast between defects and the surrounding features, enabling IR imaging equipment to acquire improved thermographic images. In some embodiments, a combination of AC and DC test vectors maximize power transfer to expedite heating, and therefore testing. Mathematical transformations applied to the improved images further enhance defect detection and analysis. Some defects produce image artifacts, or “defect artifacts,” that obscure the defects, rendering difficult the task of defect location. Some embodiments employ defect-location algorithms that analyze defect artifacts to precisely locate corresponding defects.

REFERENCES:
patent: 4628531 (1986-12-01), Okamoto et al.
patent: 5740272 (1998-04-01), Shimada
patent: 6987873 (2006-01-01), Ben-Porath et al.

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