Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate
2011-07-19
2011-07-19
Chiang, Jack (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
C716S053000
Reexamination Certificate
active
07984390
ABSTRACT:
A design data processing method in a semiconductor device includes extracting, from design data, a graphic in which there exist a first wiring and a second wiring which is orthogonal to the first wiring, and changing a portion where the first wiring is orthogonal to the second wiring to make connection at an angle other than 90 degrees, thereby preparing new design data.
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Notification of Reasons for Rejection mailed by Japanese Patent Office on Dec. 7, 2010, in Japanese patent application No. 2005-217689.
Kotani Toshiya
Nakano Ayako
Watanabe Atsushi
Chiang Jack
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Tat Binh C
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