Data processing and management equipment and method for data...

Data processing: measuring – calibrating – or testing – Measurement system – Statistical measurement

Reexamination Certificate

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C438S014000

Reexamination Certificate

active

07904275

ABSTRACT:
Management of countermeasure of pollution particles deposited on an object to be processed is optimized based on a cause of the pollution. Data processing and management equipment1comprises a functional approximation part2to make a mathematical model of a relation between measured numbers of particles deposited on a substrate during processing in a surface structuring device or a film forming device and accumulated amount processed after cleaning up of the device by a functional equation based on a cause of the deposit of the particles. A judging part3specifies the cause of the deposit of particles by comparing the functional equation with the measured numbers of particles.

REFERENCES:
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patent: 2005-535130 (2005-11-01), None
patent: WO 99/24640 (1999-05-01), None
T. Moriya, M. Shimada and K. Okuyama; “Reduction of particles in plasma etching device—Monitoring of particles and inhibition of production of particles in etching device”,, Clean Technology (Feb. 2006).
N. Ito, et al., “Reduction of particles-contamination in plasma etching equipment by dehydration of chamber wall”, Proceedings of Related Applied Physics Associated Meeting, 26a-D2 (Sep. 2002).
S. Sato, A. Tsukune, T. Goto; Visualization of backflow particles from turbo molecular pump—Are particles in lower chamber really recoiled?, Clean Technology (Jun. 2003).

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