Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-06-17
2008-10-07
Chowdhury, Tarifur R (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
Reexamination Certificate
active
07433034
ABSTRACT:
A metrology device produces broadband illumination, e.g., an illumination line, that is incident on a substrate at an oblique angle of incidence and which is scanned across the substrate. A first detector collects a darkfield image, while a second detector collects the spectrally reflected light. The angle of incidence of the illumination is variable so that the darkfield image is received by the first detector without interference from diffracting structures on the substrate. Alternatively, the position of the first detector may be varied to receive the darkfield image, or a filter may be used to filter out light from any non-defect diffracting structures on the substrate. A processor uses the darkfield data from the first detector to determine if a defect is present on the substrate and uses the spectral data from the second detector to identify the material composition of the defect.
REFERENCES:
patent: 3973849 (1976-08-01), Jackson et al.
patent: 4895445 (1990-01-01), Granger
patent: 5412468 (1995-05-01), Lundberg et al.
patent: 5798829 (1998-08-01), Vaez-Iravani
patent: 5917588 (1999-06-01), Addiego
patent: 6271916 (2001-08-01), Marxer et al.
patent: 6515745 (2003-02-01), Vurens et al.
patent: 6538730 (2003-03-01), Vaez-Iravani et al.
patent: 6633831 (2003-10-01), Nikoonahad et al.
patent: 6772084 (2004-08-01), Bischoff et al.
patent: 6778267 (2004-08-01), Drake
patent: 6781688 (2004-08-01), Kren et al.
patent: 6816249 (2004-11-01), Fairley et al.
patent: 6954267 (2005-10-01), Abraham et al.
patent: 7088443 (2006-08-01), Vaez-Iravani et al.
patent: 2002/0182760 (2002-12-01), Wack et al.
patent: 2004/0183017 (2004-09-01), Kamiya et al.
patent: 2004/0246476 (2004-12-01), Bevis et al.
patent: 2006/0038984 (2006-02-01), Vaez-Iravani et al.
Chowdhury Tarifur R
Cook Jonathon D
Halbert Michael J.
Nanometrics Incorporated
Silicon Valley Patent & Group LLP
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