Dark rims for attenuated phase shift mask

Details Dark rims for attenuated phase shift mask Dark rims for attenuated phase shift mask

1996-06-07

1998-02-10

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, G03F 900

Patent

active

057167389

ABSTRACT:
A mask for use in semiconductor fabrication which includes a light transparent substrate, preferably glass, having a border and light semitransparent material having light transmissivity preferably in the range of from about 6 to about 10 percent disposed thereon within the border. A light opaque layer which is sensitive to light and which can be patterned and have a predetermined portion thereof removed in response to selective exposure to light is disposed along substantially the entire border of the substrate. The mask can further include a region of light semitransparent material disposed around the border and under the light opaque layer. The light opaque layer is preferably a photosensitive polyimide.

REFERENCES:
patent: 5429896 (1995-07-01), Hasegawa et al.

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