Dark field target design system for alignment of semiconductor w

Details Dark field target design system for alignment of semiconductor w Dark field target design system for alignment of semiconductor w

1987-04-14

1989-11-14

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G03B 2742

Patent

active

048803090

ABSTRACT:
A dark field target design system for alignment of semiconductor wafers is disclosed. The system utilizes improved target designs which provide for improvement in the alignment of semiconductor wafers.

REFERENCES:
patent: 3903363 (1975-09-01), Montone et al.
patent: 4386849 (1983-06-01), Haeusler et al.
patent: 4639142 (1987-01-01), Chow et al.
patent: 4657379 (1987-04-01), Suwa
patent: 4662754 (1987-05-01), Mayer
Ultra Step 100 Wide Field Product Description Guide, Ultratech Stepper.

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