D.C. reactively sputtered antireflection coatings

Optical: systems and elements – Light interference – Produced by coating or lamina

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Details

359580, 359582, 359585, G02B 110

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active

052708586

ABSTRACT:
A multilayer antireflection coating designed for deposition in in-line coating machines by DC reactive sputtering. About half of the total thickness of the coating may be formed from zinc oxide which has a high sputtering rate. Conductive transparent materials including aluminum doped zinc oxide, antimony doped tin oxide, cadmium tin oxide, and indium tin oxide may be included in the coating.

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"Three-Layered Reflection-Reducing Coatings", Lockhart, L. and King, P., J. Opt. Soc. Am., vol. 37, pp. 689-694 (1947).

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