Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – With means for measuring – testing – or sensing
Patent
1996-11-22
1998-10-27
Garrett, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
With means for measuring, testing, or sensing
117 30, 117 32, 117917, C30B 3500
Patent
active
058273662
ABSTRACT:
In a Czochralski monocrystalline silicon growing apparatus for growing a silicon monocrystalline by pulling up a crystal seed by a wire in a growing furnace, a magnetic ring is mounted on the silicon monocrystal, and an electromagnet is fixed to the growing furnace for pulling up the magnetic ring.
REFERENCES:
patent: 5009865 (1991-04-01), Boden et al.
patent: 5258092 (1993-11-01), Yamagishi et al.
K.M. Kim et al., "Maximum Length of Large Diameter Czochralski Silicon Single Crystals at Fracture Stress Limit of Seed", Journal of Crystal Growth, vol. 100, 1990, pp. 527-528.
Garrett Felisa
NEC Corporation
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