Electric heating – Microwave heating – Waveguide applicator
Reexamination Certificate
2002-12-16
2004-09-28
Leung, Philip H. (Department: 3742)
Electric heating
Microwave heating
Waveguide applicator
C219S697000, C219S748000, C219S750000, C219S738000, C333S231000, C034S264000
Reexamination Certificate
active
06797929
ABSTRACT:
FIELD OF INVENTION
This invention relates to electromagnetic energy, and more particularly, to providing more efficient electromagnetic exposure.
BACKGROUND
U.S. Pat. No. 5,998,774, which is incorporated by reference in its entirety, describes an invention for creating uniformity over a cylindrical region, herein referred to as the standard cylindrical reactor. Unfortunately, the exposure width of this invention for maintaining true uniformity is limited by the maximum waveguide width for keeping the electromagnetic wave in TE
10
mode. Limited width has a disadvantage in exposing materials that require a longer exposure time to microwave energy. Similarly, some materials are not able to withstand a high power density, and a wider exposure region would lead to a lower power density.
SUMMARY
An elliptical exposure chamber has an extended focal region. In an exemplary embodiment, a plurality of cylindrical reactors form the extended focal region. Reducing the size of the opening to each cylindrical reactor reduces the amount of energy reflected and increases the overall heating. In order to efficiently deliver the electromagnetic energy to the reduced opening, a tapered waveguide has a concave end. A power splitter divides power from a central waveguide to the plurality of cylindrical reactors. The power that is delivered to each cylindrical reactor can be adjusted by adjusting the impedance of each reactor (i.e. increasing or decreasing the impedance matching), adjusting the width of each reactor, or adjusting the width of the opening to each reactor. The width of the opening to each reactor can be controlled by, for example, a movable metal plate. A dielectric wheel can be used to shift hot spots along the focal region.
REFERENCES:
patent: 2827537 (1958-03-01), Haagensen
patent: 2909635 (1959-10-01), Haagensen
patent: 3102181 (1963-08-01), Verstraten
patent: 3430021 (1969-02-01), Watson
patent: 3461261 (1969-08-01), Lewis et al.
patent: 3564458 (1971-02-01), Cumming
patent: 3710064 (1973-01-01), Mathur
patent: 3783221 (1974-01-01), Soulier
patent: 3789179 (1974-01-01), Haagensen
patent: 3873934 (1975-03-01), Oltman, Jr. et al.
patent: 4237145 (1980-12-01), Risman et al.
patent: 4760230 (1988-07-01), Hässler
patent: 5796080 (1998-08-01), Jennings et al.
patent: 5834744 (1998-11-01), Risman
patent: 5998774 (1999-12-01), Joines et al.
patent: 6020580 (2000-02-01), Lewis et al.
patent: 6104018 (2000-08-01), Varma et al.
patent: 6121595 (2000-09-01), Lewis et al.
patent: 64-30194 (1989-02-01), None
patent: 2-265149 (1990-10-01), None
patent: WO 98/34435 (1998-08-01), None
Drozd J. Michael
Joines William T.
Industrial Microwave Systems, L.L.C.
Leung Philip H.
LandOfFree
Cylindrical reactor with an extended focal region does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cylindrical reactor with an extended focal region, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cylindrical reactor with an extended focal region will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3219726