Cylindrical magnetron sputtering system

Details Cylindrical magnetron sputtering system Cylindrical magnetron sputtering system

1991-01-30

1993-01-12

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20419224, 20429824, C23C 1435, C23C 1456

Patent

active

051787431

ABSTRACT:
A system for depositing a film on a substrate includes a sputtering system and means for causing the substrate to move through the sputtering system. Embodiments of the present invention employ a cylindrical hollow cathode magnetron sputtering system, which causes the overall film deposition system to be ideally suited for coating elongate cylindrical substrates such as wires and fibers and the like.

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N. Kumar, "Aluminum Deposition on Optical Fibers by a Hollow Cathode Magnetron Sputtering System," Journal of Vacuum Science Technology, vol. A6(3) (May/Jun. 1988), pp. 1772-1774.
J. Vossen et al., "Thin Film Processes," pp. 75-113, Chapter II-2 on Cylindrical Magnetron Sputtering (Academic, New York, 1978).

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