Cylindrical hollow cathode/magnetron sputtering system and compo

Details Cylindrical hollow cathode/magnetron sputtering system and compo Cylindrical hollow cathode/magnetron sputtering system and compo

1995-04-24

1996-06-25

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429814, 20429824, 20419212, C23C 1434

Patent

active

055296742

ABSTRACT:
The invention is an expandable magnetron sputtering system that does not require an external vacuum chamber and has a valveless, continuously-open, straight through, air-to-air sputtering path. The system is based on connectable cathode modules and anode modules that each have an opposed pair of apertures. The modules themselves may beneficially serve as part of an integral vacuum chamber. Using vacuum-tight connectors, the modules are connected end-to-end with their apertures aligned to form the vacuum-tight sputtering path. Differential vacuum entries are provided on opposite sides of the sputtering path.

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