Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1996-08-26
1998-05-19
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429828, 20429825, 20429819, 20429809, 156345, 118719, C23C 1434
Patent
active
057530920
ABSTRACT:
A sputtering system comprising three concentric cylinders. The inner and outer cylinders, along with top and bottom sealing flanges, form an annular chamber with cylindrical walls. A central cylinder, disposed between the inner and outer cylinders, includes substrate-carrying openings and serves as a cylindrical carriage which substantially fills the annular chamber passageway and is rotatable in predetermined steps relative to the chamber. Substrate processing devices for deposition, etching, heating, and cooling arc attached around the circumference of the inner and/or outer cylinders. Vacuum pumps are located between substrate processing devices. The openings in the cylindrical carriage are each fitted with a substrate holder for supporting a multiplicity of substrates. Entrance and exit vacuum load-locks are provided for transferring substrates into and out of the system. The system is designed for substrate processing temperatures of 1000.degree. C. and above.
REFERENCES:
patent: 3294670 (1966-12-01), Charschan et al.
patent: 4051010 (1977-09-01), Roth et al.
patent: 4500407 (1985-02-01), Boys et al.
patent: 4734158 (1988-03-01), Gillis
patent: 4749465 (1988-06-01), Flint et al.
patent: 4756794 (1988-07-01), Yoder
patent: 4798663 (1989-01-01), Herklotz et al.
patent: 4818358 (1989-04-01), Hubert et al.
patent: 4851095 (1989-07-01), Scobey et al.
patent: 4860139 (1989-08-01), Hamilton
patent: 4894132 (1990-01-01), Tanaka
patent: 4894133 (1990-01-01), Hedgcoth
patent: 4909314 (1990-03-01), Lamont, Jr.
patent: 5163218 (1992-11-01), Hamilton
patent: 5209830 (1993-05-01), Martena
patent: 5252194 (1993-10-01), Demaray et al.
patent: 5262028 (1993-11-01), Manley
patent: 5287914 (1994-02-01), Hughes
patent: 5425611 (1995-06-01), Hughes et al.
patent: 5466296 (1995-11-01), Misiano et al.
"Intevac's New MDP-250 Produces High Quality Small Disks"; Intevac Vacuum Systems Division (Sep. 1991).
Data Storage (Feb. 1996), p. 48 beginning "SCSI IDS connector sports three prongs".
Leybold Ag, 2-page brochure entitled "Circulus M65 Single Disk coater for the Production of 65 mm Rigid Disks", undated.
Leybold Ag, 1 sheet entitled "Circulus PC 130", undated.
Hollars Dennis R.
Zubeck Robert B.
Hamrick Claude A.S.
Nguyen Nam
Velocidata, Inc.
LandOfFree
Cylindrical carriage sputtering system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cylindrical carriage sputtering system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cylindrical carriage sputtering system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1849509