Cylindrical apparatus for growth of epitaxial layers

Details Cylindrical apparatus for growth of epitaxial layers Cylindrical apparatus for growth of epitaxial layers

1993-09-28

1995-08-15

Chaudhuri, Olik

Coating apparatus

Gas or vapor deposition

Work support

118729, C23C 1600

Patent

active

054415713

ABSTRACT:
A cylindrical apparatus for the growth of epitaxial layers having disposed inside a bell jar a susceptor provided thereon with pockets for retaining a substrate is disclosed. It allows the flow rate of a raw material gas inside the apparatus to be uniformized, the fluctuation of film thickness of epitaxial layers within one batch to be repressed below 5%, and the fluctuation of film thickness of an epitaxial layer in the substrate to be decreased by equalizing the gap area between the peripheral surface of the susceptor and the internal wall surface of the bell jar at least in the lateral wall portions of the bell jar confronting the substrates on the susceptor.

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patent: 4976216 (1990-12-01), Maeda et al.
patent: 5002011 (1991-03-01), Ohmine et al.
patent: 5053247 (1991-10-01), Moore

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