Drying and gas or vapor contact with solids – Apparatus – With apparatus using centrifugal force
Patent
1987-06-25
1988-04-05
Miles, Tim
Drying and gas or vapor contact with solids
Apparatus
With apparatus using centrifugal force
261122, F26B 1710
Patent
active
047349999
ABSTRACT:
A cylinder for metal organic chemical vapor deposition is disclosed, characterized in that, in the cylinder for metal organic chemical vapor deposition, wherein a throwing port for organometallic compound and an introducing port for inert gas are provided at the upper portion of cylinder, the inert gas being made to be charged into cylinder through a tube inserted into the cylinder and a distributor fitted at the lower end thereof, and an exhaust port for gas of organometallic compound and inert gas is provided at the upper portion of cylinder, the lower portion of the cylinder is made a narrow-diameter portion of reduced inside diameter compared with the upper portion of cylinder, the inside diameter of this narrow-diameter portion lying within a range from 1.1 times the diameter of distributor to 3/4 of the inside diameter of upper portion of cylinder and the length of this narrow-diameter portion being 1.2 to 5 times the inside diameter of said narrow-diameter portion, and a slant portion is provided at the upside of said narrow-diameter portion.
REFERENCES:
patent: 1995215 (1935-03-01), Mehlsen et al.
patent: 3925024 (1975-12-01), Hollingsworth et al.
patent: 4099939 (1978-07-01), Vancheri et al.
patent: 4251926 (1981-02-01), Bagley et al.
patent: 4363639 (1982-12-01), Gladon
patent: 4494452 (1985-01-01), Barzso
patent: 4587744 (1986-05-01), Huttlin
patent: 4698913 (1987-10-01), Voll
Fujisawa Masao
Morimasa Kazuhiro
Miles Tim
Toyo Stauffer Chemical Co., Ltd.
LandOfFree
Cylinder for metal organic chemical vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cylinder for metal organic chemical vapor deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cylinder for metal organic chemical vapor deposition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2226644