Cyclic voltammetric method for the measurement of concentrations

Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy

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204402, 204434, G01N 2726

Patent

active

051924030

ABSTRACT:
A cyclic voltammetric method for measuring concentrations of subcomponents of additive mixtures, comprising the steps of: (a) preparing a basis solution which contains all of the components of an unknown solution to be measured, except a component of interest; (b) preparing a calibration solution which contains the component of interest in a known concentration near that which would be expected in the unknown solution; (c) adding measured amounts of the calibration solution to a first defined volume of the basis solution and plotting a first cathodic charge against the added volume of the calibration standard; (d) adding measured amounts of the unknown solution to a second volume of the basis solution and plotting a second cathodic charge against the added volume of the unknown solution; and (e) comparing the slopes of the first and second curves to determine the concentration of the component of interest in the unknown solution.

REFERENCES:
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patent: 4725339 (1988-02-01), Bindra et al.
patent: 4786373 (1988-11-01), Salcheimo et al.
patent: 4917774 (1990-04-01), Fisher
patent: 4917777 (1990-04-01), Fisher
"Cyclic Voltammetric Stripping Analysis of Acid Copper Sulfate Plating Baths", by Haak, Ogden and Trench, Plating and Surface Finishing, Apr. 1981.
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"Introducing The Biggest Advance in Plating Bath Analysis Since The Hull Cell", UPA Technology, Inc. Copyright 1983.
"Take the guesswork out of plating bath control", ECI Technology, ECI Technology, Copyright 1989.

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