Cyclic loading system and methods for forming nanostructures

Details Cyclic loading system and methods for forming nanostructures Cyclic loading system and methods for forming nanostructures

2007-10-19

2009-12-15

Ewald, Maria Veronica D (Department: 1791)

Plastic article or earthenware shaping or treating: apparatus

Preform reshaping or resizing means: or vulcanizing means...

Surface deformation means only

C264S293000

Reexamination Certificate

active

07632088

ABSTRACT:
Systems and methods for forming patterns and structures in target materials are described. The method produces a pattern or structure in a target material by contacting a stamp including one or more features with a target material using a normal load sufficient for keeping the one or more features in contact with the target material, and providing a cyclic shear force in an amount sufficient to extrude the target material and form a negative relief of the one more features in the target material. The systems and methods can be used to produce a variety of articles including, but not limited to, semiconductor integrated electrical circuits, integrated optical, magnetic, mechanical circuits and microdevices.

REFERENCES:
patent: 4701660 (1987-10-01), Baumgartner et al.
patent: 5772905 (1998-06-01), Chou
patent: 5849435 (1998-12-01), Akram et al.
patent: 6362028 (2002-03-01), Chen et al.
patent: 2005/0006343 (2005-01-01), Choi et al.
patent: 2005/0274693 (2005-12-01), Heidari et al.
patent: 2008/0145774 (2008-06-01), Kruijt-Stegeman et al.
Asif and Pethica, “Thin films: stresses and mechanical properties VI,”MRS Symp. Proc.505:103-108(1998).
Asif, Determination of polymer. mechanical properties from. pyramidal indentation, Doctoral Thesis, Oxford 1997.
Asif, et al. “Nanoindentation creep of single-crystal tungsten and gallium arsenide,” Philosophical Magazine A, 76(6)1105-1118 (1997).
Austin, et al. “Fabrication of 5nm linewidth and 14 nm pitch features by nanoimprint lithography”Appl. Phys. Lett.84:5299-5301(2004).
Bartels, et al. “Basic steps of lateral manipulation of single atoms and diatomic clusters with a scanning tunneling microscope tip”.Physical Review Letters79(4) :697-700(1997).
Batrh and Reichling, “Imaging the atomic arrangements on the high-temperature reconstructed α-AI2O3(0001) surface,”Nature414:54 57 (2001).
Chou, et al., “Sub-10 nm imprint lithography and applications,”J. Vac. Sci. Tech.B14:4129-1233 (1996).
Clarke, et al., “Quantitative Scanning Tunneling Microscopy at Atomic Resolution: Influence of Forces and Tip Configuration,”Phys Rev Lett.76:1276-1279(1996).
Colburn, et al. “Step and flash imprint lithography: a new approach to high-resolution patterning,”Proc SPIE3676(1):379-90(1999).
Crommie, et al. “Quantum Corrals”Physica D83(1-3)98-108 (1995).
Cross, et al., “Influence of elastic strains on the mask ratio in glassy polymer nanoimprint,”Appl. Phys. Lett.86:081902 (2005).
Eigler, et al. “Positioning single atoms with a scanning tunnelling microscope,”Nature344, 524-526 (1990).
Fishlock, et al. “Manipulation of atoms across a surface at room temperature”Nature404(6779):743-745 (2000).
Graham, et al. “Room Temperature Mechanical Thinning and Imprinting of Solid Films”Nano Letters7(2):357-362(2007).
Hoffman, et al. “Direct measurement of interatomic force gradients using an ultra-low amplitude AFM,”Proc. R. Soc.London, A457:1161 (2007).
Hoffman, et al. “Energy Dissipation in Atomic Force Microscopy and Atomic Loss Processes,”Phys. Rev. Lett.87:265502-6 (2001).
Hong and Lee, “Pattern uniformity control in room-temperature imprint lithography,”Applied Physics Letters83(12): 2441-2443(2003).
Oral, et al. “Quantitative atom-resolved force gradient imaging using noncontact atomic force microscopy,”Applied Physics Letters2001—vol. 79(12):1915-1917.
Ozer, “Low-amplitude, force gradient imaging of Cu(100) surface using tunnel current feedback,”Nanotechnology15:1-4, S5-S8(2004).
Pethica, “Hardness measurement at penetration depths as small as 20 nm,”Philosophical Magazine A, 48(4): 593-606 (1983).
Pethica, et al. “Tip Surface Interactions in STM and AFM”Phys. Scr.T19A 61-66 (1987).
Vettiger, “The Nanodrive Project: Inventing a nanotechnology device for mass production and consumer use is trickier than it sounds,”Scientific AmericanJan. 2003.
Wang, et al. “Arrangement of rotational domains of the (root31xroot31)R±9 degree reconstruction of AI2O3(0001) revealed by non-contact AFM,”Surface Science515:337-343(2002).

Affiliated with

Also associated with

Rating

Cyclic loading system and methods for forming nanostructures does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cyclic loading system and methods for forming nanostructures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cyclic loading system and methods for forming nanostructures will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4095134