Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...
Reexamination Certificate
2007-06-19
2007-06-19
Dentz, Bernard (Department: 1625)
Organic compounds -- part of the class 532-570 series
Organic compounds
Heterocyclic carbon compounds containing a hetero ring...
C528S402000, C216S042000
Reexamination Certificate
active
10563557
ABSTRACT:
The present invention provides a fluorine-containing cyclic compound represented by general formula (1):wherein R1represents a halogen atom, and R2and R3each represents hydrogen or a hydrocarbon group. The above-mentioned hydrocarbon group is a straight-chain, branched or cyclic hydrocarbon group having 1 to 25 carbon atoms or an aromatic hydrocarbon group, and may contain a halogen atom, an oxygen atom, a nitrogen atom or a sulfur atom. Further, a fluorine-containing polymerizable monomer derived from the above-mentioned fluorine-containing cyclic compound, a fluorine-containing polymer compound obtained by polymerization or copolymerization using the above-mentioned compound or monomer, further a resist material and a pattern forming process using the above-mentioned polymer compound are also disclosed. According to the invention, there is provided the polymer compound suitable for a resist material having high transparency in a wide wavelength region from an ultraviolet region to a near-infrared light region, high adhesion to a substrate, film forming properties, high etching resistance and a high glass transition point at once, particularly for a photoresist material in a vacuum ultraviolet wavelength region. Further, the pattern forming process using the polymer compound is suitable for the formation of a high-resolution pattern form.
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Kodama et al., “Synthesis of Novel Fluoropolymer for 157 nm Photoresists by Cyclo-polymerization”, Proceedings of SPIE, vol. 4690, 2002, pp. 76-83.
Komoriya Haruhiko
Maeda Kazuhiko
Sumida Shinichi
Central Glass Company Limited
Dentz Bernard
Young & Thompson
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