Cyclic acetals or ketals of beta-keto esters or amides

Details Cyclic acetals or ketals of beta-keto esters or amides Cyclic acetals or ketals of beta-keto esters or amides

1986-05-05

1988-04-12

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Nonsilver image

430270, 430192, 430176, 430311, 430326, 430189, 430177, 430179, 430 18, 549370, 549375, 549448, 549454, G03C 516, G03C 1495

Patent

active

047374268

ABSTRACT:
Compounds of formula I ##STR1## in conjunction with compounds that donate acid when exposed to actinic radiation, are suitable for use as positive photoresists. In formula I, R.sup.1 and R.sup.2 are hydrogen, alkyl, aryl, cycloalkyl, aralkyl or alkaryl, R.sup.3 to R.sup.8 are hydrogen or lower alkyl, X is --O-- or --NR.sup.9 --, where R.sup.9 is hydrogen or C.sub.1 -C.sub.4 alkyl, n is 0 or 1, m is 2, 3 or 4 and Q is an organic radical of valency m.
The photoresists are suitable for making printing forms, printed circuits, integrated circuits or silver-free photographic films.

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