CW shock initiated HF/DF laser

Details CW shock initiated HF/DF laser CW shock initiated HF/DF laser

1975-06-30

1976-09-21

Sikes, William L.

Oscillators

Molecular or particle resonant type

330 43, H01S 309

Patent

active

039822087

ABSTRACT:
A continuous working chemical laser is disclosed. A primary gas such as hydrogen or deuterium is mixed with an activator for a secondary gas, and desirably with a buffer such as a noble gas. The primary gas mixture and a secondary gas such as fluorine are mixed at low temperature and subsequently a laser emitting chemical reaction is triggered. In one embodiment the gases are mixed in supersonic flow and the reaction is triggered by a shock wave. In another embodiment the reaction is triggered by external stimulation such as ultraviolet radiation or electric discharge or the like.

REFERENCES:
patent: 3701045 (1972-10-01), Bronfin et al.
patent: 3818374 (1974-06-01), Emanuel
patent: 3832650 (1974-08-01), Roberts

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