Coating processes – Coating by vapor – gas – or smoke
Patent
1993-10-22
1995-10-31
King, Roy V.
Coating processes
Coating by vapor, gas, or smoke
427250, 4272557, 4274191, 437 67, 437919, 216 58, 216 79, C23C 1600, H01L 21306
Patent
active
054627672
ABSTRACT:
A CVD method for forming a conformal coating over a depression or a cave in a top surface is disclosed, which comprises the steps of forming at least one depression or a cave in said top surface where at least a portion of the depression or the cave has an inner surface; providing a reactive precursor containing at least an alkyl metal compound; and CVD forming from a gas of said reactive precursor at least one metal-containing layer over said top surface and said depression or cave such that the ratio ds/dt of the thickness (ds) of the layer on the inner surafce of the depression or cave and the thickness (dt) of the layer on the top surface is substantially one.
REFERENCES:
patent: 3200018 (1965-08-01), Grossman
patent: 3772098 (1973-11-01), Tribes
patent: 4017885 (1977-04-01), Kendall et al.
patent: 4104086 (1978-08-01), Bondur et al.
patent: 4137100 (1979-01-01), Zaleckas
patent: 4140558 (1979-02-01), Murphy et al.
patent: 4327476 (1982-05-01), Iwai et al.
patent: 4343657 (1982-08-01), Ito et al.
patent: 4371587 (1983-02-01), Peters
patent: 4394196 (1983-07-01), Iwai
patent: 4397075 (1983-08-01), Fatula, Jr. et al.
patent: 4444801 (1984-04-01), Hongo et al.
patent: 4466992 (1984-08-01), Dreiling
patent: 4502914 (1985-03-01), Trumpp et al.
patent: 4506434 (1985-03-01), Ogawa et al.
patent: 4509249 (1985-04-01), Goto et al.
patent: 4526631 (1985-07-01), Silvestri et al.
patent: 4544576 (1985-10-01), Chu et al.
patent: 4571819 (1986-02-01), Rogers et al.
patent: 4577395 (1986-03-01), Shibata
patent: 4580331 (1986-04-01), Soclof
patent: 4588610 (1986-05-01), Yamazaki
patent: 4624736 (1986-11-01), Gee et al.
patent: 4645564 (1987-02-01), Morie et al.
patent: 4662064 (1987-05-01), Hsu et al.
patent: 4670091 (1987-06-01), Thomas et al.
patent: 4685198 (1987-08-01), Kawakita et al.
patent: 4690729 (1987-09-01), Douglas
patent: 4695479 (1987-09-01), Nakakura et al.
patent: 4702795 (1987-10-01), Douglas
patent: 4708767 (1987-11-01), Bril
patent: 4711699 (1987-12-01), Amano
patent: 4724159 (1988-02-01), Yamazaki
patent: 4735821 (1988-04-01), Yamazaki et al.
patent: 4845048 (1989-07-01), Tamaki et al.
patent: 4861622 (1989-10-01), Yamazaki et al.
patent: 4872947 (1989-10-01), Wang et al.
patent: 5079615 (1992-01-01), Yamazaki et al.
patent: 5084130 (1992-01-01), Yamazaki et al.
IBM Technical Disclosure Bulletin vol. 27 No. 11 Apr. 1985 "Dynamic RAM Cell with Merged Drain and Storage" pp. 6694-6697.
"VLSI Fabrication Principles-Silicon and Gallium Arsenide", Sorab K. Ghandi Rensselaer Polytechnic Institute-Scientific Library Pat & T.M. Office, 1983, pp. 582-585.
"Buried Storage Electrode (BSE) Cell for Megabit DRAMS", M. Sakamoto et al., VLSI Development Division, NEC Corporation, Japan pp. 710-713, 1985.
"A Deep-Trenched Capacitor Technology for 4 Mega Bit Dynamic RAM", K. Yamada et al. VLSI Research Center, Toshiba Corporation, Japan pp. 702-705, 1985.
"Photo-CVD for VLSI Isolation" John Yuan-tai & Richard C. Henderson; Hughes Research Laboratories, Malibu, Calif. 90265, pp. 2146-2151, 1984.
Wolf et al, "Silicon Processing for the VLSI Era", vol. 1: Process Technology, pp. 185-187, Lattice Process (California) 1986.
Inujima Takashi
Yamazaki Shunpei
Ferguson Jr. Gerald J.
King Roy V.
Semiconductor Energy Laboratory Co,. Ltd.
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