CVD method of depositing a silica coating on a heated glass subs

Details CVD method of depositing a silica coating on a heated glass subs CVD method of depositing a silica coating on a heated glass subs

1996-07-29

1998-08-25

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

4272551, 4272552, 4272553, 427314, 427109, 427167, 65 608, C23C 1640

Patent

active

057981426

ABSTRACT:
A method of pyrolytically forming a silica-containing coating on a glass substrate at an elevated temperature. Silane, oxygen, a radical scavenger gas and a carrier gas are combined as a precursor mixture, and the precursor is directed toward and along the surface of the heated glass substrate. The presence of the radical scavenger allows the silane, which is pyrophoric, to be premixed with the oxygen without undergoing ignition and premature reaction at the operating temperatures. The radical scavenger further provides control of and permits optimization of the kinetics of the chemical vapor deposition (CVD) reaction on the glass. A preferred combination of precursor materials includes monosilane and oxygen, with ethylene as the radical scavenger, and including nitrogen as a carrier gas.

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