CVD method for forming metal film by using metal carbonyl gas

Details CVD method for forming metal film by using metal carbonyl gas CVD method for forming metal film by using metal carbonyl gas

2008-09-23

2008-09-23

Chen, Bret (Department: 1792)

Coating processes

Coating by vapor, gas, or smoke

Metal coating

C427S255230, C427S383100

Reexamination Certificate

active

11119906

ABSTRACT:
A CVD method for forming a metal film on a substrate by using a metal carbonyl gas includes a preparing step for setting a vacuum chamber at a vacuum pressure and heating the substrate in the vacuum chamber to a first temperature where the metal carbonyl gas is decomposed. Also included are a supplying step for supplying the metal carbonyl gas into the vacuum chamber while exhausting the vacuum chamber with a first vacuum pumping speed and a removing step for removing a decomposed gas of the metal carbonyl gas by stopping supplying of the metal carbonyl gas and quickly exhausting the vacuum chamber with a second vacuum pumping speed sufficiently higher than the first vacuum pumping speed. The supplying step and the removing step can be repeatedly as desired.

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