CVD method for coating a glass substrate

Details CVD method for coating a glass substrate CVD method for coating a glass substrate

1995-03-01

1997-03-04

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

Moving the base

4272552, 4272551, 427166, 427109, 427 9, 427 10, 65 605, C23C 1600, C03C 1700

Patent

active

056077254

ABSTRACT:
A method for applying a coating to a substrate comprises a gas distributor having an outlet disposed adjacent to the substrate for directing a gaseous reactant mixture to the surface of the substrate. A plurality of drop tubes are provided which communicate with and are spaced along the length of the distributor for supplying the gaseous reactant mixture to the distributor. The uniformity of the thickness of the coating which is applied to the substrate along its width is determined. Finally, one or more of the reactants or an inert gas is supplied to one or more of the drop tubes to alter the concentration of one or more of the reactants in the gaseous reactant mixture flowing through one or more drop tubes. The rate of deposition of the coating in the proximity of such drop tubes is thereby altered to improve the uniformity of the coating deposited.

REFERENCES:
patent: 4676992 (1987-06-01), Letellier
patent: 4732776 (1988-03-01), Boissevain
patent: 5009485 (1991-04-01), Hall
patent: 5217753 (1993-06-01), Goodman et al.

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