CVD method and apparatus for forming a film

Details CVD method and apparatus for forming a film CVD method and apparatus for forming a film

1986-04-08

1988-01-12

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

118 501, B05D 306

Patent

active

047191228

ABSTRACT:
A CDV method in which a substrate having a surface to be deposited where the film is placed in a reaction chamber and a reactive gas introduced into the reaction chamber is excited by irradiation with flat light and scattered light to thereby deposit the film on the substate surface. The flat light is directed along the substrate surface in close proximity thereto, and the scattered light is directed to the substrate surface thereto.

REFERENCES:
patent: 4260649 (1981-04-01), Denison et al.
patent: 4435445 (1984-03-01), Allred et al.
patent: 4568565 (1986-02-01), Gupta et al.
patent: 4581248 (1986-04-01), Roche
patent: 4581249 (1986-04-01), Kamiya

Affiliated with

Also associated with

Rating

CVD method and apparatus for forming a film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with CVD method and apparatus for forming a film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and CVD method and apparatus for forming a film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-920733