Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1979-10-24
1981-03-31
Kaplan, Morris
Coating apparatus
Gas or vapor deposition
Multizone chamber
118724, 118729, C23C 1114
Patent
active
042586585
ABSTRACT:
An apparatus useful for the chemical vapor deposition treatment of small parts is provided. The articles to be treated are received upon a frame and the CVD treatment is carried out within a heated receptor, with the deposition material feed line movable for more uniform coating. Immediately subsequent to the CVD treatment, the coating may be hardened by removing the supporting frame from the still hot receptor by attaching the frame to the movable material feed line. The small parts are now able to be rapidly quenched in freely circulating cooling air.
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IBM Technical Disclosure Bulletin, vol. 9, No. 5 [Oct. 1966]Hornberger, "Producing Epitaxial Germanium Deposits", pp. 538-539.
IBM Technical Disclosure Bulletin, vol. 21, No. 7 [Dec. 1978], pp. 3016-3018, Brewer et al., "Apparatus for Depositing Thin Films".
Hieber Konrad
Politycki Alfred
Stolz Manfred
Kaplan Morris
Siemens Aktiengesellschaft
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