CVD apparatus and process for the preparation of fiber-reinforce

Coating apparatus – Gas or vapor deposition – Work support

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118724, 118725, 264 81, 4272552, C23C 1630

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active

048951080

ABSTRACT:
An apparatus and process for the chemical vapor deposition of a matrix into a preform having circumferentially wound ceramic fibers, comprises heating one surface of the preform while cooling the other surface thereof. The resulting product may have fibers that are wound on radial planes or at an angle from the radial planes. The fibers can also be precoated with pyrolytic carbon before application of the matrix. The matrix is applied by passing reactant gas through the preform thereof to the other side thereof for the initial deposition of matrix near such other surface of the preform. The matrix fills in the preform from the other side surface thereof to the surface of the side of application thereof until a desired amount of matrix has been deposited.

REFERENCES:
patent: 3673051 (1972-06-01), Clark et al.
patent: 4275095 (1981-06-01), Warren
patent: 4397901 (1983-08-01), Warren
patent: 4580524 (1986-04-01), Lackey, Jr. et al.
patent: 4766013 (1988-08-01), Warren
"Boron Nitride Chemical Vapor Infiltration of Fibrous Materials from BCl.sub.3 --NH.sub.3 --H.sub.2 or BF.sub.3 --NH.sub.3 Mixtures: A Thermodynamic and Experimental Approch," H. Hannache, R. Naslain, and C. Bernard in Journal of Less-Common Metals, 95, pp. 221-246, (1983).
"Laminate Optimization for Filamentary Composites," L. E. Hackman and C. L. Stotter in Advanced Fibrous Reinforced Composites, vol. 10, pp. C-1 thru C-11, a publication of Society of Aerospace Materials and Process Engineers, 10th National Symposium and Exhibit, Nov. 9-11, 1966.
"The Process Development and Mechanical Testing of a Carbon/Carbon Composite Fabricated by Chemical Vapor Infiltration of a Filament-Wound Substrate," by J. D. Theis, Jr., Third International Conference on Chemical Vapor Deposition, 1972, edited by F. A. Glaski, American Nuclear Society.
"CVD Boron Nitride Infiltration of Fibrous Structures: Properties of Low Temperature Deposits," by J. J. Gebhardt in Fourth International Conference on Chemical Vapor Deposition, 1973, edited by G. F. Wakefield and J. M. Blocher, Electrochemical Society.
C. F. Powell et al., Vapor Deposition, J. Wiley & Sons, Inc., 1966, pp. 374-375, 378-384, and 663-665.

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