Coating processes – Coating by vapor – gas – or smoke
Patent
1993-08-26
1995-04-18
Bell, Janyce
Coating processes
Coating by vapor, gas, or smoke
427250, 427252, 427345, C23C 1600
Patent
active
054077044
ABSTRACT:
Chemical vapor deposition apparatus comprises a reactor having a chamber with a coating region for coating a substrate and an exhaust region communicating with the coating region. The coating region includes an inlet for introduction of a gaseous reactant stream to pass over the substrate to react therewith to form a coating thereon and a spent gas stream. The exhaust region includes an outlet for exhausting the spent gas stream from the coating region. The substrate is supported in the coating region and heated to an elevated reaction temperature by suitable support means and heating means. A condensing assembly is disposed in the exhaust region for condensing excess, unreacted gaseous reactant from the spent gas stream before entry into the outlet. The condensing assembly includes a high surface area, apertured structure disposed in the exhaust region where the temperature of the spent gas stream is sufficiently reduced to condense excess, unreacted gaseous reactant therefrom. An enclosure is disposed around the condensing structure and configured to direct the spent gas stream from the coating region to flow through the condensing structure where the excess, unreacted gaseous reactant can condense before entering the outlet.
REFERENCES:
patent: 3486927 (1969-12-01), Gauje
patent: 3976436 (1976-08-01), Chang
patent: 4098450 (1978-07-01), Keller et al.
patent: 4156042 (1979-05-01), Hayman et al.
patent: 4181161 (1980-01-01), Kraus
patent: 4239819 (1980-12-01), Holzl
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4427720 (1984-01-01), Gauje
patent: 4468283 (1984-08-01), Ahmed
patent: 4525389 (1985-06-01), Stemmler et al.
patent: 4653428 (1987-03-01), Wilson et al.
patent: 4747368 (1988-05-01), Brien et al.
patent: 4751109 (1988-06-01), Sarin et al.
patent: 4788082 (1988-11-01), Schmitt
patent: 4890574 (1990-01-01), Sarin et al.
patent: 4933239 (1990-06-01), Olson et al.
patent: 5045348 (1991-09-01), Brierley et al.
patent: 5250323 (1993-10-01), Miyazaki
Handbook of Plasma Processing Technology, cover page and page 10, Rossnagel, Cuomo and Westwood; copyright 1990, (no month).
"Platinum Modified Aluminides-Present Status"; Gas Turbine and Aeroengine Congress and Exposition, Jun. 11-14, 1990, Brussels, Belgium, Smith and Boone.
"Kinetics of the Formuation of Nickel Aluminide Coatings on Pure Nickel by Chemical Vapour Deposition"; Thin Solid Films, 146, (1987), pp. 55-64, Sun, Lin and Hon, (no month).
"Vapor Phase Aluminizing to Protect Turbine Airfoils"; pp. 13-27, Gauje and Morbioli, (no date).
"Codeposition of Chromium and Aluminum During a Pack Process"; pp. 27-35, Marijnissen, (no date).
"A Process for Protecting Gas Turbine Blade Cooling Passages Against Degradation"; Superalloys, 1980, pp. 405-411; Restall, Gill, Hayman and Archer, (no month).
"Preparation of Hot Corrosion Resistant Aluminide Layers by CVD of Aluminium from its Subchloride"; pp. 578-592, Brennfleck, Fitzer and Kehr, (no date).
Vapor-Plating, "The Formation of Coatings by Vapor-Deposition Techniques"; pp. 24-26, 65-66, Powell and Campbell, 1955, (no month).
"The HF `Fluoride-ion` Cleaning Technique for Superalloys"; Ti Coating, Inc.; pp. 1-6, 1987, (no month).
"Pack Cementation Coatings for Superalloys A Review of History, Theory, and Practice"; Gas Turbine Conference and Exhibition, May 31 to Jun. 4, 1987, Anaheim, Calif., Goward and Cannon.
"Coated Tools: Two Decades of Improving Productivity"; Cutting Tool Engineering; vol. 41, No. 2, Feb. 1989, Clavel.
Basta William C.
Near Daniel L.
Punola David C.
Smith Jeffery S.
Bell Janyce
Howmet Corporation
Timmer Edward J.
LandOfFree
CVD apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with CVD apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and CVD apparatus and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-65342