CVD apparatus

Details CVD apparatus CVD apparatus

1990-03-23

1991-08-06

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118 501, 118500, 118728, C23C 1600

Patent

active

050367943

ABSTRACT:
A CVD apparatus in which a reaction chamber includes a pair of electrodes which define a plasma generating space therebetween. A metallic enclosure surrounds the plasma generating space thereby preventing plasma which has been produced within the space from escaping. The enclosure can be utilized to support one or more substrates to be coated.

REFERENCES:
patent: 3682699 (1972-08-01), Koga et al.
patent: 4033287 (1977-07-01), Alexander, Jr. et al.
patent: 4287851 (1981-09-01), Dozier
patent: 4424096 (1984-01-01), Kumagai
patent: 4576830 (1986-03-01), Kiss
patent: 4582720 (1986-04-01), Yamazaki
patent: 4593644 (1986-06-01), Hanak
patent: 4633809 (1987-01-01), Hirose et al.

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