Cut-and-paste imprint lithographic mold and method therefor

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature

Reexamination Certificate

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C438S692000, C438S706000, C438S738000, C438S745000, C438S748000, C257SE21024

Reexamination Certificate

active

07344955

ABSTRACT:
A method (and apparatus) of replicating a pattern on a structure, includes using imprint lithography to replicate a pattern formed on a first structure onto a portion of a second structure.

REFERENCES:
patent: 5756234 (1998-05-01), Groves et al.
patent: 6485870 (2002-11-01), Uchikawa
patent: 6814898 (2004-11-01), Deeman et al.
patent: 2003/0205658 (2003-11-01), Voisin
patent: 2004/0021866 (2004-02-01), Watts et al.

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