Cut and blast defect to avoid chrome roll over annealing

Details Cut and blast defect to avoid chrome roll over annealing Cut and blast defect to avoid chrome roll over annealing

1997-09-30

2000-06-13

Padgett, Marianne

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching using radiation

216 65, 216 66, 427534, 427552, 427555, 427556, 427140, B05D 300, C23C 1402

Patent

active

060745711

ABSTRACT:
A method and apparatus for repairing black dot defects connected to a circuit pattern in photomasks such as a photomask having a patterned chromium film on a glass substrate comprises using an energy source in the form of an energy beam to first sever the connected black dot defect from the chrome pattern forming a space between the defect and the chrome pattern. The remaining severed black dot defect is then removed using the same or different energy beam to remove the remainder of the chrome defect. An apparatus for removing black dot defects and photomasks produced by the method and apparatus of the invention are also provided.

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