Curtain coating process for producing thin photoimageable coatin

Details Curtain coating process for producing thin photoimageable coatin Curtain coating process for producing thin photoimageable coatin

1992-06-29

1993-08-17

Lusigan, Michael

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427510, 427542, 427557, 427209, 427294, 427295, 427384, 4273982, 427470, B05D 130

Patent

active

052367460

ABSTRACT:
A process for producing thin photoresists on printed circuit boards wherein a metallic-layered substrate is conveyed beneath a free falling curtain of a photopolymerizable substance, said substance having a viscosity of 30-120 seconds DIN cup 4 @ 25.degree. C. and being applied at a curtain height of 5-25 cm. above the board to form a coating having a dry film thickness up to about 1.5 mil after the coated surfaces are dried, whereupon the surfaces are available for photoimaging, developing, etching and stripping operations.

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Dainihon Screen, Patent Abstracts of Japan, vol. 8, No. 139 (E-253) (1576) Jun. 28, 1984 Abstracting JP-A-59 048 925.
Matsuchita Eltrn Corp., World Patents Index Latest, Week 5089 AN 89-368034 Abstracting JP-A-01 276 632.
ZEV-Leiterplatten, pp. 20-24 (Nov. 1990).
Dr. N. Ivory (PC Fab) pp. 30-38 (Apr. 1990).

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