Current-voltage-based method for evaluating thin dielectrics...

Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C324S765010

Reexamination Certificate

active

07737717

ABSTRACT:
A method for evaluating gate dielectrics (100) includes providing a test structure (101). The test structure includes a gate stack that includes a gate electrode on a gate dielectric on a substrate, and at least one diffusion region diffused in the substrate including a portion below the gate stack and a portion beyond the gate stack. Pre-stress off-state I-V testing (102) is performed on the test structure to obtain pre-stress I-V test data, wherein the pre-stress off-state I-V testing includes a first measurement involving the gate electrode, the substrate and the diffusion region, a second measurement involving the gate electrode and the substrate with the diffusion region floating, and a third measurement involving the gate electrode and the diffusion region with the substrate floating. The test structure is then stressed (103) including electrically stressing for a time (t). Following the stressing, post-stress I-V testing is performed (104) wherein the first, second and third measurements are repeated to obtain post-stress I-V test data. The gate dielectric is evaluated (105) from the pre-stress and post-stress I-V test data.

REFERENCES:
patent: 5999011 (1999-12-01), Chu et al.
patent: 6815970 (2004-11-01), Rost et al.
patent: 2003/0224545 (2003-12-01), Chung et al.
patent: 2006/0076971 (2006-04-01), Krishnan et al.
patent: 2008/0096292 (2008-04-01), Chatterjee
patent: 2008/0129326 (2008-06-01), Agarwal et al.
Nicollian et al, Texas Instruments Inc.; Low Voltage Stress-Induced-Leakage-Current in Ultrathin Gate Oxides; pp. 400-404.
Paul E. Nicollian; Thesis: Physics of Trap Generation And Electrical Breakdown In Ultra-Thin Si02 and SiON Gate Dielectric Materials, Aug. 2007; pp. 1-174.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Current-voltage-based method for evaluating thin dielectrics... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Current-voltage-based method for evaluating thin dielectrics..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Current-voltage-based method for evaluating thin dielectrics... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4245865

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.