Curing hydrogen silsesquioxane resin with an electron beam

Details Curing hydrogen silsesquioxane resin with an electron beam Curing hydrogen silsesquioxane resin with an electron beam

1995-12-04

1997-03-11

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427504, 427552, 427596, 427 96, B05D 306

Patent

active

056099258

ABSTRACT:
A low temperature method of forming silica-containing ceramic coatings on substrates in which a coating containing hydrogen silsesquioxane resin is applied on a substrate and exposed to an electron beam for a time sufficient to convert the hydrogen silsesquioxane resin to the silica-containing ceramic coating. This method is especially valuable for forming protective and dielectric coatings on electronic devices.

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patent: 5436029 (1995-07-01), Ballance et al.
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