Curing apparatus

Details Curing apparatus Curing apparatus

1992-03-05

1992-10-13

Yuen, Henry C.

Heating

Advancing structure flexing, looping or coiling sheet, web...

432146, 432148, 432175, 432194, F27B 928

Patent

active

051546043

ABSTRACT:
A curing apparatus used in manufacturing semiconductor devices including high-temperature gas chamber and heating chamber communicated with slits formed in a partition plate installed between the two chambers. Gas diffusion plates are installed in the gas chamber at right angles against the flow of gas so that the diffused and uniform high-temperature gas passes through slits and blown onto workpieces placed directly beneath the slits.

REFERENCES:
patent: 1596214 (1926-08-01), O'Brien
patent: 4357762 (1982-11-01), Eustacchio
patent: 4482314 (1984-11-01), Giese et al.
patent: 4529379 (1985-07-01), Di Castri
patent: 4569660 (1986-02-01), Bossett
patent: 4790749 (1988-12-01), Mauro
patent: 4792302 (1988-12-01), Baker et al.
patent: 4936772 (1990-06-01), Zajac

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