Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Patent
1996-08-29
1999-11-30
Berman, Susan W.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
522146, 522149, 522162, 522163, 522165, 522166, 522178, 522904, 522905, 106 20D, 347 20, 4302701, 4302801, 4302811, C08F 246, G03F 7004, C08L 6300, C08L 7112
Patent
active
059944250
ABSTRACT:
Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.
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Fuller Timothy J.
Luca David J.
Mosher Ralph A.
Narang Ram S.
Smith Thomas W.
Berman Susan W.
Byorick Judith L.
Xerox Corporation
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