Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1988-12-27
1990-11-27
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
5253288, 525454, 525450, 528287, 528288, 528293, 528295, 524901, 523412, 523413, C25D 1306
Patent
active
049733923
ABSTRACT:
This invention relates to coating compositions which comprise a polymer having at least two hydroxy functional groups and a crosslinking agent having an average of at least two pendent ester groups of the general formula: ##STR1## wherein R.sup.1 and R.sup.2 are independently hydrogen, alkyl, substituted alkyl or aryl groups; n is from about 1 to about 5; X is nitrogen, sulfur or phosphorus; and when X is either nitrogen or phosphorus, R.sup.3 is hydrogen, lower alkyl, or an aryl group; R.sup.4 is lower alkyl or an aryl group; and when X is sulfur, R.sup.4 is nothing and R.sup.3 is either hydrogen, lower alkyl or aryl.
REFERENCES:
patent: 4405662 (1983-09-01), Raudenbusch et al.
patent: 4423167 (1983-12-01), Valko
patent: 4423169 (1983-12-01), Valko
patent: 4427805 (1984-01-01), Kooijmans et al.
patent: 4430462 (1984-02-01), Jaeger
patent: 4440612 (1984-04-01), Valko
patent: 4489182 (1984-12-01), Valko
patent: 4491611 (1985-01-01), Barnhoorn et al.
patent: 4511447 (1985-04-01), Valko
U.S. Ser. No. 07/290,620; filed 12-27-88; Gupta & Mels; Curable Coating Compositions Comprising Self-Crosslinkable Components.
Hsing Ben C.
McDonald Robert E.
Niebling John F.
Tan Steven W.
The Sherwin-Williams Company
LandOfFree
Curable coating compositions comprising crosslinked components does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Curable coating compositions comprising crosslinked components, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Curable coating compositions comprising crosslinked components will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1030653