Cubic boron nitride preparation utilizing nitrogen gas

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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204164, 204192N, 204192C, 427 38, C23C 1500

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active

044128991

ABSTRACT:
Cubic boron nitride is deposited on a substrate by an activated reactive evaporation method involving heating a substrate in a vacuum, evaporating metal vapors into a zone between the substrate and the metals source, said source consisting of pure boron, or boron and a material selected from the group consisting of the elements chromium, nickel, cobalt, and manganese co-evaporated, or an alloy consisting essentially of from 0.1 weight percent to 5.0 weight percent of at least one of the elements chromium, nickel, cobalt, and manganese, the balance being boron, or an alloy consisting essentially of at least 60 percent by weight to the balance of boron with from 0.2 to 12 percent by weight of aluminum, and at least 0.2 to 24 percent by weight of at least one of cobalt, nickel, manganese, or other aluminide forming element; introducing nitrogen gas into the zone, and generating an electrical field in the zone in order to ionize the metal vapors and gas atoms in the zone with an electrically negative bias impressed on the substrate, the value of the bias depending upon the particular activated reactive evaporation process utilized.

REFERENCES:
patent: 4297387 (1981-10-01), Beale

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