Crystallization apparatus, crystallization method, and phase...

Details Crystallization apparatus, crystallization method, and phase... Crystallization apparatus, crystallization method, and phase...

2007-02-06

2007-02-06

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10734248

ABSTRACT:
A phase shift mask is arranged before a laser device through a beam expander, a homogenizer and a mirror, and a processed substrate is set on an opposed surface of the phase shift mask with an image forming optical system therebetween. The processed substrate is held at a predetermined position by using a substrate chuck such as a vacuum chuck or an electrostatic chuck.

REFERENCES:
patent: 6057063 (2000-05-01), Liebmann et al.
patent: 6248606 (2001-06-01), Ino et al.
patent: 6749971 (2004-06-01), Lukanc et al.
patent: 2004/0126674 (2004-07-01), Taniguchi et al.
patent: 0 035 561 (1981-09-01), None
patent: 1 047 119 (2000-10-01), None
Mitsuru Nakata et al., A New Nucleation-Site-Control Excimer-Laser-Crystallization method, Jpn. J. Appl. Phys. vol. 40 (2001), pp. 3049-3054.
Chang-Ho et al., A Novel Phase-Modulated Excimer-Laser Crystallization Method of Silicon Think Films, Jpn. J. Appl. Phys. vol. 37 (1998) pp. L492-L495.
International Search Report Sep. 24, 2004.

Affiliated with

Also associated with

Rating

Crystallization apparatus, crystallization method, and phase... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Crystallization apparatus, crystallization method, and phase..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Crystallization apparatus, crystallization method, and phase... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3857936