Crystalline semiconductor film and production method...

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having moving solid-liquid-solid region

Reexamination Certificate

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C117S044000, C117S045000, C117S046000, C117S047000, C117S904000, C117S905000

Reexamination Certificate

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07153359

ABSTRACT:
A crystalline semiconductor film, the crystalline semiconductor film being formed over an insulative substrate, and including semiconductor crystal grains laterally grown along a surface of the insulative substrate, wherein the laterally-grown semiconductor crystal grains are in contact with each other at grain boundaries, and a distance between adjacent grain boundaries is equal to or smaller than two times a lateral growth distance of the semiconductor crystal grains.

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Korean Office Action dated Nov. 26, 2006 (w/out English translation).

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