Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1991-12-20
1993-10-05
Breneman, R. Bruce
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
502 80, 502 84, 502150, 502242, 502240, 208 46, 208108, 208111, 208113, 208120, 208134, 208135, 585407, 585480, 585481, C01B 3334
Patent
active
052502775
ABSTRACT:
There is provided a crystalline oxide material with a characteristic X-ray diffraction pattern. This material may be a layered material, which is swollen or pillared. Upon calcination of the swollen material, the layers collapse and condense upon one another in a somewhat disordered fashion to form a non-swellable material. However, the swollen layered material may be intercalated with polymeric oxide pillars to maintain layer separation, even after calcination.
REFERENCES:
patent: 4439409 (1984-03-01), Puppe et al.
patent: 4859648 (1989-08-01), Landis et al.
patent: 4954325 (1990-09-01), Rubin et al.
Kresge Charles T.
Roth Wieslaw J.
Simmons Kenneth G.
Vartuli James C.
Breneman R. Bruce
Kenehan, Jr. Edward F.
McKillop Alexander J.
Mobil Oil Corp.
Santini Dennis P.
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