Crystalline metal film

Details Crystalline metal film Crystalline metal film

2007-08-07

2009-06-30

King, Roy (Department: 1793)

Metal treatment

Stock

Vanadium, niobum, or tantalum base

C420S427000, C420S428000, C420S429000, C420S430000, C428S209000, C428S544000, C148S423000

Reexamination Certificate

active

07553381

ABSTRACT:
A metal film according to the present invention has a cubic crystal structure having a periodic pattern of crystal orientation in a plane. The crystal orientation is gradually rotated about a particular crystal-axis direction such that a {100} plane, a {110} plane, and a {111} plane appear.

REFERENCES:
patent: 4192695 (1980-03-01), Mahalla
patent: 6374482 (2002-04-01), Mihara et al.
patent: 6834943 (2004-12-01), Ogawa et al.
patent: 11-48488 (1999-02-01), None
Muto, H., et al., “The Large-Scale Deformation of Polycrystalline Aggregates: Cooperative Grain-Boundary Sliding”, Acta mater., vol. 48 (2000), 4161-4167.
Lim, J., et al., “Effect of Substrate Bias Voltage on the Thermal Stability of Cu/Ta/Si Structures Deposited by Ion Beam Deposition”, Jpn. J. Appl. Phys., vol. 42 (2003), pp. 2780-2785.
Hoogeveen, R., et al., “Texture and phase transformation of sputter-deposited metastable Ta films and Ta/Cu multilayers”, Thin Solid Films 275 (1996), pp. 203-206.

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