Coating apparatus – Gas or vapor deposition – With treating means
Patent
1982-07-01
1985-05-21
Smith, John D.
Coating apparatus
Gas or vapor deposition
With treating means
118726, 118728, 118712, 29 2535, 310312, 324 56, C23C 1312
Patent
active
045179182
ABSTRACT:
An improved crystal plating device having a base containing a power circuit and an oscillating circuit. The base is provided with a chamber and has a sealed top enclosing the chamber. At least one pair of filament posts are fixed to the base and disposed within the chamber and in the power circuit. A filament is connected across the filament posts. A crystal holder is removably connected with the base. The crystal is held by the holder in the oscillating circuit. A pump is connected to the base to vacuum pump the chamber. Energizing the circuits will oscillate the crystal and evaporate the filament to plate the crystal and produce the desired frequency therefore.
Filament posts each comprising a hollow body having an insulating sleeve thereon are threadedly received on a member affixed to the base. A slot is provided in the body near the upper end with a spring biased pivotable lever, the filament being disposed within the slot. Pivoting the lever of the filament post sideways will permit engagement of the filament in the slot upon release of the lever.
Contact pins extending through the base into the chamber produce enhanced electrical contact with the crystal holder in the chamber to ensure superior operation of the oscillating circuit during the plating apparatus.
REFERENCES:
patent: 2765765 (1956-10-01), Bigler et al.
patent: 4236487 (1980-12-01), Kaplan
Holland, "Vacuum Deposition of Thin Films", John Wiley & Sons Inc., New York, 1956, pp. 114 to 120.
Emkay Manufacturing Co.
Plantz Bernard F.
Smith John D.
Weingram Edward R.
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