Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Patent
1980-10-06
1982-04-06
McIntosh, John P.
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
118723, 118726, 118728, 118500, 118712, C23C 1308, C23C 1312
Patent
active
043230318
ABSTRACT:
A crystal plating device and method thereof in which a crystal to be plated and thereby set at a desired frequency is placed in an external removable holder or slug for insertion into a chamber of a plating device. The device is connected to a vacuum pump which is activated after the slug is loaded. Spring loaded filament posts carry a filament of precious metal such as gold or silver. The crystal is oscillated at a predetermined frequency prior to the filament being energized to evaporate or atomize the metal which plates the crystal and sets it frequency identical to that of the oscillator.
The slug is externally loaded and can carry different size crystals. It is fitted with masks to accurately direct the deposit of the metal upon either or both sides of the crystal. After plating the slug is easily removed from the plating device.
REFERENCES:
patent: 2639392 (1953-05-01), Warner, Jr.
patent: 2765765 (1956-10-01), Bigler et al.
patent: 2864332 (1958-12-01), Woolley
Vacuum Evaporation Procedure, Lentz, IBM Technical Disclosure Bulletin, vol. 5, No. 1, Jun. 1962.
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