Crystal-oriented thin film manufacturing apparatus

Details Crystal-oriented thin film manufacturing apparatus Crystal-oriented thin film manufacturing apparatus

1994-09-27

1996-10-22

Breneman, R. Bruce

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429811, 20429815, C23C 1434, C23C 1450

Patent

active

055672884

ABSTRACT:
A substrate electrode having a plurality of substrate holders capable of causing a substrate to tilt by an arbitrary angle .theta. relative to the horizontal plane is provided. A plurality of auxiliary electrodes are arranged substantially vertically below the substrate electrode and between the substrate electrode and a target. The substrate electrode and the auxiliary electrodes are electrically insulated from the target. Bias voltage applied to the substrate electrode and the auxiliary electrodes causes the plasma boundary between the cathode dark space and the negative glow to form a cathodic plasma space having a parabolic section, thus forming a crystal-oriented thin film on the substrate surface.

REFERENCES:
patent: 3530057 (1970-09-01), Muly, Jr.
patent: 3897325 (1975-07-01), Aoshima et al.
patent: 4297189 (1981-10-01), Smith, Jr. et al.
patent: 4407894 (1983-10-01), Kadokura et al.
patent: 5114556 (1992-05-01), Lamont, Jr.

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